It provides a place where specialists from industry and advanced research as well as equipment and software providers become acquainted with new developments and results.

The EMLC 2025 International Program Committee

Honorary President
Behringer, Uwe, UBC Microelectronics, Ammerbuch, Germany

Conference Chairs
Stolberg, Ines, Vistec Electron Beam, Jena, Germany
Finders, Jo, ASML, Veldhoven, The Netherlands

Conference Co-Chairs
Connolly, Brid, Toppan Photomasks Inc., Dresden, Germany
Hayashi, Naoya, DNP, Saitama, Japan

Program Chairs
Loeschner, Hans, IMS Nanofabrication, Brunn am Gebirge & Vienna, Austria
Erdmann, Andreas, Fraunhofer IISB, Erlangen, Germany
Peters, Jan Hendrik, BMBG Consult, Radebeul, Germany

Other Program Committee Members
Abboud, Frank, Intel Corporation, Santa Clara, CA, USA
Bottaglieri, Gerardo, ASML, The Netherlands
Ehrmann, Albrecht, Carl Zeiss SMT Oberkochen, Germany
Fay, Aurelien, CEA-Leti, Grenoble, France
Galler, Reinhard, EQUIcon, Dresden, Germany
Le Gratiet, Bertrand, ST Microelectronics, Crolles, France
Jefferies, James, HOYA Europe, London, UK
Levinson, Harry J., HJL Lithography, Saratoga, CA, USA
Maas, Raymond, ASML, Veldhoven, The Netherlands
Maly, Enrico, Photronics MZD GmbH, Dresden, Germany
Muehlberger, Michael, Profactor, Steyr-Gleink, Austria
Noack, Nico, AMTC Dresden, Germany
Pain, Laurent, CEA, Grenoble, France
Ronse, Kurt, IMEC, Leuven, Belgium
Scheruebl, Thomas, Carl Zeiss SMT, Jena, Germany
Schnabel, Ronald, VDE/VDI-GMM, Offenbach am Main, Germany
Schneider, Jens, Infineon Technologies, Dresden, Germany
Schuch, Nivea, Applied Materials, Grenoble, France
Sundermann, Frank, STMicroelectronics, Crolles, France
Tschinkl, Martin, Toppan Photomasks, Germany
Varga, Ksenija, EV Group, St. Florian am Inn, Austria
Wurm, Stefan, ATICE LLC, Albany, NY, USA
Yoshitake, Shusuke, NuFlare Technology, Yokohama, Japan
Zeggaoui, Nassima, Siemens Industry Software Inc., Meylan, France
Zurbrick, Larry, Keysight Technologies, Santa Clara, USA

ZEISS endows the "ZEISS Award for Talents in Photomask Industry" 

The award was established in 2016 to support students working in the fields of photomasks.

To be considered,

• The student must present a poster or presentation at European Mask and Lithography Conference
• The students must identify themselves as a student during abstract submission
• The student must be the lead manuscript author
• The student must attend the conference and present it during the session or be present during the poster session

The award will be assessed by an award committee consisting of members of the EMLC Program Committee. Contributions will be judged for technical merit, relevance of the topic to the industry and the author’s ability to explain the work.

Winners will be awarded a ZEISS certificate and a trophy. He or she receives a donation of 2,500 EUR to cover the travel expenses.

Hilton Dresden
An der Frauenkirche 5, 01067 Dresden, 
Germany
phone: +49 (0)351 8642-0
E-Mail: info@hiltondresden.com

Hilton Hotel Dresden - on the doorstep of Dresden's Old Town - Your Event Location

The Hilton Hotel is located at the heart of Dresden's Old Town, one block from the River Elbe and overlooking Dresden's Frauenkirche, the Church of Our Lady. Hilton is within a kilometer of local dining and historic sites, such as the Zwinger building and its surrounding gardens. Enjoy access to the health club, featuring a fitness center, indoor pool with sauna, outdoor whirlpool - and, above all: Enjoy the EMLC Conference 2025 in Dresden!

The room rate is € 149 per night including breakfast.
Please book your rooms in time as the room contingent expires on April 16, 2025.

Please use the underlined link for your bookings!

Please contact GMM-Office for questions concerning the conference.

You would like to be informed about the next steps concerning this conference? So please register as prospective customer.